Scanning Nonlinear Dielectric Microscopy
Investigation of Ferroelectric, Dielectric, and Semiconductor Materials and Devices

Woodhead Publishing Series in Electronic and Optical Materials Series

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Language: English

193.44 €

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256 p. · 15x22.8 cm · Paperback

Scanning Nonlinear Dielectric Microscopy: Investigation of Ferroelectric, Dielectric, and Semiconductor Materials and Devices is the definitive reference on an important tool to characterize ferroelectric, dielectric and semiconductor materials. Written by the inventor, the book reviews the methods for applying the technique to key materials applications, including the measurement of ferroelectric materials at the atomic scale and the visualization and measurement of semiconductor materials and devices at a high level of sensitivity. Finally, the book reviews new insights this technique has given to material and device physics in ferroelectric and semiconductor materials.

The book is appropriate for those involved in the development of ferroelectric, dielectric and semiconductor materials devices in academia and industry.

1. Principals of scanning nonlinear dielectric microscopy for measuring ferroelectric and dielectric polarization 2. Ferroelectric polarization measurement 3. Three-dimensional polarization measurement 4. Ultra high-density ferroelectric data storage using scanning nonlinear dielectric microscopy 5. Linear permittivity measurement by scanning nonlinear dielectric microscopy 6. Noncontact scanning nonlinear dielectric microscopy 7. Scanning nonlinear dielectric potentiometry for measurement of the potential induced by atomic dipole measurements 8. Principles of scanning nonlinear dielectric microscopy for semiconductor measurements 9. Carrier distribution measurement in semiconductor materials and devices 10. Super-higher-order scanning nonlinear dielectric microscopy 11. Local deep-level transient spectroscopy 12. Time-resolved scanning nonlinear dielectric microscopy

Materials Scientists and Engineers, Electrical Engineers, Physicists, Researchers in both academia and R&D
Yasuo Cho graduated in 1980 from Tohoku University in electrical engineering department. In 1985 he became a research associate at Research Institute of Electrical Communication Tohoku University. In 1990, he received an associate professorship from Yamaguchi University. He then became an associate professor in 1997 and a full professor in 2001 at Research Institute of Electrical Communication Tohoku University. During this time, his main research interests included nonlinear phenomena in ferroelectric materials and their applications, research on the scanning nonlinear dielectric microscopy (SNDM), and research on using the SNDM in next-generation ultrahigh density ferroelectric data storage (SNDM ferroelectric probe memory).
  • Presents an in-depth look at the SNDM materials characterization technique by its inventor
  • Reviews key materials applications, such as measurement of ferroelectric materials at the nanoscale and measurement of semiconductor materials and devices
  • Analyzes key insights on semiconductor materials and device physics derived from the SNDM technique