Description
Handbook of Plasma Processing Technology
Fundamental, Etching, Deposition and Surface Interactions
Authors: Rossnagel Stephen M., Westwood William D., Cuomo Jerome J.
Language: EnglishSubjects for Handbook of Plasma Processing Technology:
Publication date: 12-1990
546 p. · 15x22.8 cm · Hardback
Out of Print
546 p. · 15x22.8 cm · Hardback
Out of Print
Description
/li>Contents
/li>Readership
/li>
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Techniques for IC ProcessingIntroduction to Plasma Concepts and Discharge ConfigurationsFundamentals of Sputtering and ReflectionBombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and HalidesRF Diode Sputter Etching and DepositionMagnetron Plasma Deposition ProcessesBroad-Beam Ion SourceReactive Ion EtchingReactive Sputter DepositionPlasma Enhanced Chemical Vapor Deposition of Thin Films for MicroelectronicsElectron Cyclotron Resonance Microwave Discharges for Etching and Thin Film DepositionHollow Cathode Etching and DepositionIon PlatingIonized Cluster Beam (ICB) Deposition TechniquesThe Activated Reactive Evaporation (ARE) ProcessFormation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)Selective Bias Sputter DepositionVacuum Arc-Based ProcessingIon Source Interactions: General UnderstandingsIon Assisted DepositionMicrostructural Control of Plasma-Sputtered Refractory Coatings
Scientists, engineers, graduate students in the fields of semiconductors, thin films, energy, environment, automotive, medical and food packaging.
© 2024 LAVOISIER S.A.S.
These books may interest you
Plasma Processing of Semiconductors 316.49 €
Plasma Processing of Nanomaterials 232.80 €