Description
Design for Manufacturability with Advanced Lithography, Softcover reprint of the original 1st ed. 2016
Authors: Yu Bei, Pan David Z.
Language: EnglishSubjects for Design for Manufacturability with Advanced Lithography:
52.74 €
In Print (Delivery period: 15 days).
Add to cart the print on demand of Yu Bei, Pan David Z.
Design for Manufacturability with Advanced Lithography
Publication date: 08-2016
Support: Print on demand
Publication date: 08-2016
Support: Print on demand
Approximative price 52.74 €
In Print (Delivery period: 15 days).
Add to cart the print on demand of Yu Bei, Pan David Z.
Design for Manufacturability with Advanced Lithography
Publication date: 11-2015
Support: Print on demand
Publication date: 11-2015
Support: Print on demand
Description
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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Introduction.- Layout Decomposition for Triple Patterning.- Layout Decomposition for Other Patterning Techniques.- Standard Cell Compliance and Placement Co-Optimization.- Design for Manufacturability with E-Beam Lithography.- Conclusions and Future Works.-
Enables readers to tackle the challenge of layout decompositions for different patterning techniques Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design Includes coverage of the design for manufacturability with E-Beam lithography
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